New analysis of reversal bleach mechanism and catalytic reaction of exposure quantity in silver halide material

Byong Ho Yoon; Nam Kim; Woon Sik Baek

doi:10.1117/12.271363

10 April 1997 New analysis of reversal bleach mechanism and catalytic reaction of exposure quantity in silver halide material

Byong Ho Yoon, Nam Kim, Woon Sik Baek

Author Affiliations +

Proceedings Volume 3011, Practical Holography XI and Holographic Materials III; (1997) https://doi.org/10.1117/12.271363
Event: Electronic Imaging '97, 1997, San Jose, CA, United States

Abstract

A new analysis of the reversal bleaching mechanism and the catalytic reaction of exposure quantity in silver halide holographic diffraction gratings is presented. It is turned out that the exposure quantity reacts as a catalyst in the developing process and makes the velocity of developing reaction time fast. The experimental investigation has revealed that the holographic phase gratings with high diffraction efficiencies (> 70%) could be taken, if the developing reaction time be optimized in the 50 approximately 350 [(mu) J/cm²] range of exposure quantity.

Citation Download Citation

Byong Ho Yoon, Nam Kim, and Woon Sik Baek "New analysis of reversal bleach mechanism and catalytic reaction of exposure quantity in silver halide material", Proc. SPIE 3011, Practical Holography XI and Holographic Materials III, (10 April 1997); https://doi.org/10.1117/12.271363

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