Paper
17 September 1997 Comparison of spatial self-filtering using numerical, photorefractive, and nonphotorefractive techniques
Ernst Ulrich Wagemann, Hans J. Tiziani
Author Affiliations +
Proceedings Volume 3098, Optical Inspection and Micromeasurements II; (1997) https://doi.org/10.1117/12.281169
Event: Lasers and Optics in Manufacturing III, 1997, Munich, Germany
Abstract
In periodic structures the Fourier peaks have to be removed in order to enhance defects. This can be done by digital image processing or by optical means. Recently we presented some new developments in microscopic defect enhancement by spatial self-filtering using B12SiO20 (BSO) in the Fourier plane of an optical processor. In this paper we summarize spatial filtering using photorefractive, non- linear devices and equivalent numerical techniques. We sue BSO as photorefractive medium and two different optically addressed spatial light modulators as nonlinear devices.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ernst Ulrich Wagemann and Hans J. Tiziani "Comparison of spatial self-filtering using numerical, photorefractive, and nonphotorefractive techniques", Proc. SPIE 3098, Optical Inspection and Micromeasurements II, (17 September 1997); https://doi.org/10.1117/12.281169
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KEYWORDS
Image enhancement

Liquid crystals

Birefringence

Crystals

Transmittance

Optically addressed spatial light modulators

Image filtering

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