Cost-effective mask fabrication on Kapton membrane for deep x-ray lithography

Stefan Stadler; I. Derhalli; Chantal G. Khan Malek

doi:10.1117/12.284546

2 September 1997 Cost-effective mask fabrication on Kapton membrane for deep x-ray lithography

Stefan Stadler, I. Derhalli, Chantal G. Khan Malek

Proceedings Volume 3225, Microlithography and Metrology in Micromachining III; (1997) https://doi.org/10.1117/12.284546
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States

Abstract

A low-cost mask fabrication process for deep x-ray lithography is described. The mask consists of Kapton films stretched on a ring with absorber structures formed by optical lithography using NFR015 resist and gold electroplating, similar to the masks from the 'early x-ray lithography age'. Such masks proved easy to fabricate and are presently being evaluated for deep x-ray lithography applications. First experiments indicate that they exhibit sufficient radiation resistance and limited variational dimensional changes during exposure at 1.3-1.5 GeV on the XRLM3 beamline at CAMD.

Citation Download Citation

Stefan Stadler, I. Derhalli, and Chantal G. Khan Malek "Cost-effective mask fabrication on Kapton membrane for deep x-ray lithography", Proc. SPIE 3225, Microlithography and Metrology in Micromachining III, (2 September 1997); https://doi.org/10.1117/12.284546

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