Paper
2 September 1997 High-precision positioning stages for micro- and nanolithography
Donald Croft, Santosh Devasia
Author Affiliations +
Proceedings Volume 3225, Microlithography and Metrology in Micromachining III; (1997) https://doi.org/10.1117/12.284555
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States
Abstract
Low scanning speed as well as hysteresis nonlinearities have been fundamental limitations of scanning probe based micro/nano-fabrication techniques. Scanning speeds are typically limited to about 1/10th the fundamental vibrational mode of the piezo-positioning system while hysteresis nonlinearities cause significant errors in large- range positioning applications. This paper presents a method to achieve higher scan rates by using inversion of the piezo-actuator dynamics as well as by compensating for the hysteresis nonlinearities. The approach decouples the inversion into (a) inversion of the hysteresis nonlinearities and (b) inversion of the structural dynamics, to find an input voltage profile that achieves precision tracking of a desired scan trajectory. The results show that an order of magnitude increase in scanning speed is achieved, while maintaining precision tracking of the desired scan path.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donald Croft and Santosh Devasia "High-precision positioning stages for micro- and nanolithography", Proc. SPIE 3225, Microlithography and Metrology in Micromachining III, (2 September 1997); https://doi.org/10.1117/12.284555
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Cited by 2 scholarly publications.
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KEYWORDS
Nanolithography

Structural dynamics

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