Quartz - The Ultimate Mask Material For Optical Lithography?

Gilbert J. Zinsmeister

doi:10.1117/12.933410

30 June 1982 Quartz - The Ultimate Mask Material For Optical Lithography?

Gilbert J. Zinsmeister

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933410
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Quartz has an extremely low thermal expansion and is fully transparent down to wavelengths below 200 nm. These properties allow users of quartz substrate masks to push optical lithography to its limits.

Citation Download Citation

Gilbert J. Zinsmeister "Quartz - The Ultimate Mask Material For Optical Lithography?", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933410

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