ArF excimer laser for 193-nm lithography

Uwe Stamm; Rainer Paetzel; Juergen Kleinschmidt; Klaus Vogler; Wolfgang Zschocke; Igor Bragin; Dirk Basting

doi:10.1117/12.310730

29 June 1998 ArF excimer laser for 193-nm lithography

Uwe Stamm, Rainer Paetzel, Juergen Kleinschmidt, Klaus Vogler, Wolfgang Zschocke, Igor Bragin, Dirk Basting

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310730
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Considerable progress has been made in the development of the major components for 193 nm lithography tools. Here we describe the parameters of a line-narrowed ArF excimer laser for microlithography. With a specified FWHM bandwidth of less than 0.7 pm, the laser is applicable for refractive steppers and scanners which utilize some degree of achromatization. Prototype lasers have been built to study the optimum parameters. The main challenge of the development was the achievement of high efficiency in the conversion from the laser's broadband emission into line-narrowed emission. The lasers are operated at up to 1 kHz repetition rate with a maximum power of 10 W. This paper provides an overview of the currently achievable power levels, energy stability and bandwidths and discusses future trends.

Citation Download Citation

Uwe Stamm, Rainer Paetzel, Juergen Kleinschmidt, Klaus Vogler, Wolfgang Zschocke, Igor Bragin, and Dirk Basting "ArF excimer laser for 193-nm lithography", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310730

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