Characterization of Mo/B4C soft x-ray multilayer mirrors for 7.3- to 8.0-nm radiation

Junxia Lu; Yueying Ma; Shu Pei; Jianlin Cao; Xingdan Chen

doi:10.1117/12.331287

19 November 1998 Characterization of Mo/B₄C soft x-ray multilayer mirrors for 7.3- to 8.0-nm radiation

Junxia Lu, Yueying Ma, Shu Pei, Jianlin Cao, Xingdan Chen

Proceedings Volume 3444, X-Ray Optics, Instruments, and Missions; (1998) https://doi.org/10.1117/12.331287
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

Mo/B₄C is chosen for the materials of the multilayer mirrors for 7.3nm and 8.0nm. The structural parameter has been designed and the mirrors has been fabricated by magnetron sputtering. Details in the microstructure of Mo/B₄C multilayer were revealed using x-ray diffraction and TEM. The period thickness of each mirrors can be determined from the curve of x-ray diffraction, and they are 3.74nm and 4.12nm, respectively, which are in good agreement with the design parameters.

Citation Download Citation

Junxia Lu, Yueying Ma, Shu Pei, Jianlin Cao, and Xingdan Chen "Characterization of Mo/B₄C soft x-ray multilayer mirrors for 7.3- to 8.0-nm radiation", Proc. SPIE 3444, X-Ray Optics, Instruments, and Missions, (19 November 1998); https://doi.org/10.1117/12.331287

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