Surface Microanalysis Characterization Of ThF4 Thin Films

Ronald L. Lusk

doi:10.1117/12.933790

15 September 1982 Surface Microanalysis Characterization Of ThF₄ Thin Films

Ronald L. Lusk

Proceedings Volume 0346, Thin Film Technologies and Special Applications; (1982) https://doi.org/10.1117/12.933790
Event: 1982 Technical Symposium East, 1982, Arlington, United States

Abstract

This study was to investigate the chemical composition of typical laser mirror coatings to locate and identify absorbing impurities in ThF₄ thin films. Analysis by scanning Auger Electron Spectroscopy, X-Ray Photoelectron Spectroscopy and Secondary Ion Mass Spectroscopy showed an abnormally high oxygen content in the films which indicates the presence of water and may eliminate ThF₄ as a potential coating material for HF (2.75 micron) laser systems.

Citation Download Citation

Ronald L. Lusk "Surface Microanalysis Characterization Of ThF₄ Thin Films", Proc. SPIE 0346, Thin Film Technologies and Special Applications, (15 September 1982); https://doi.org/10.1117/12.933790

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