LWM 200 CD metrology tool evaluation

Robert Uitz; John M. Whittey

doi:10.1117/12.332821

18 December 1998 LWM 200 CD metrology tool evaluation

Robert Uitz, John M. Whittey

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332821
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

Metrology tool performance may be based on a number of different factors. Areas such as ease of use, user interface, throughput, long and short term precision, sub-micron linearity, and accuracy are features which may be evaluated. Some areas are subjective and not easily quantifiable. This paper is concerned with evaluating and measuring the areas which are quantifiable such as the tool's 'Gauge R&R' (reproducibility and repeatability), measurement time, long term precision, and reliability. Explanations of the measurement evaluation methods will be presented along with performance data that is indicative of the system's performance.

Citation Download Citation

Robert Uitz and John M. Whittey "LWM 200 CD metrology tool evaluation", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332821

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