Adapting existing e-beam writers to write HEBS-glass gray-scale masks

Ernst-Bernhard Kley; Matthias Cumme; Lars-Christian Wittig; Chuck Wu

doi:10.1117/12.349333

1 June 1999 Adapting existing e-beam writers to write HEBS-glass gray-scale masks

Ernst-Bernhard Kley, Matthias Cumme, Lars-Christian Wittig, Chuck Wu

Proceedings Volume 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI; (1999) https://doi.org/10.1117/12.349333
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

Analogue contact lithography is a suitable technology for the fabrication of continuous surface profiles. In this field HEBS-glass gray scale masks have a great potential, for instance for producing microoptical elements. This paper summarizes detailed investigations on the electron beam exposure of HEBS-glass masks. At first we give an idea of the effects we obtained by exposing HEBS-glass masks with different kinds of e-beam writers (Gaussian beam and variable shape e-beam writer). We found thermal effects and a bottleneck effect which have different consequences for the gray level of the exposed mask. To understand its physical causes the bottleneck effect was investigated in detail. Based on this knowledge we introduce two different strategies to overcome the problems caused by the different concepts of the e-beam writer. Selected examples of fabricated profiles demonstrate the facilities of HEBS-glass using these strategies.

Citation Download Citation

Ernst-Bernhard Kley, Matthias Cumme, Lars-Christian Wittig, and Chuck Wu "Adapting existing e-beam writers to write HEBS-glass gray-scale masks", Proc. SPIE 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI, (1 June 1999); https://doi.org/10.1117/12.349333

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