Microstructure and radiation interactions of optical interference coatings for 193-nm applications

Joerg Heber; Roland Thielsch; Holger Blaschke; Norbert Kaiser; Uwe Leinhos; A. Goertler

doi:10.1117/12.360076

7 September 1999 Microstructure and radiation interactions of optical interference coatings for 193-nm applications

Joerg Heber, Roland Thielsch, Holger Blaschke, Norbert Kaiser, Uwe Leinhos, A. Goertler

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360076
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

In this paper, we report on our investigations of radiation induced processes in optical interference coatings for 193 nm applications with respect to the microstructure of the coating. Experimental studies revealed that fluoride coatings contribute the main source for radiation induced optical changes during its exposure to 193 nm laser irradiation due to their porous microstructure. NIR spectroscopy could identify the origin of optical changes in interference coatings as a reversible hydrocarbon contamination which occurs within the coatings from storage in air atmosphere. Additionally, Laser Induced Damage Threshold measurements show a direct influence of the hydrocarbon contamination on the radiation durability of the multilayer systems during laser exposure. Experiments were carried out by using several characterization techniques including DUV spectrophotometry, ATR-IR-spectroscopy, x-ray diffractometry, and the determination of the '1-on-1' laser induced damage threshold. Test methods were applied to DUV coatings before and after exposure to 193 nm radiation with irradiation doses of up to 10⁸ laser pulses at a fluence of 70mJ/cm². Test samples consisted of several coating designs, primarily of high reflective multilayer systems.

Citation Download Citation

Joerg Heber, Roland Thielsch, Holger Blaschke, Norbert Kaiser, Uwe Leinhos, and A. Goertler "Microstructure and radiation interactions of optical interference coatings for 193-nm applications", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360076

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available