Advanced holography for microelectronic manufacturing: novel methods well fitted for real time in the line checks performed in the industrial environment

Valery Petrov

doi:10.1117/12.346906

27 April 1999 Advanced holography for microelectronic manufacturing: novel methods well fitted for real time in the line checks performed in the industrial environment

Valery Petrov

Author Affiliations +

Proceedings Volume 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346906
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

Current manufacturing processes require rapid, inexpensive and reliable techniques for optical inspections of machinery, products and components. Holography and holographic interferometry in spite of their attractive features are rather rarely used for industrial inspections due to relative complexity, costs, lengthy multi-stage procedures, need of dark roms and vibration insulation. Personnel skilled in optics ins also required. Thus holography is usually regarded as poorly compatible with practical industrial environment.

Citation Download Citation

Valery Petrov "Advanced holography for microelectronic manufacturing: novel methods well fitted for real time in the line checks performed in the industrial environment", Proc. SPIE 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, (27 April 1999); https://doi.org/10.1117/12.346906

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