Pulsed-laser deposition as a novel preparation technique for chemical microsensors

Michael J. Schoening; Juergen Schubert; Willi Zander; Mattea Mueller-Veggian; Andrey V. Legin; Yuri G. Vlasov; Peter Kordos; Hans Lueth

doi:10.1117/12.370281

18 November 1999 Pulsed-laser deposition as a novel preparation technique for chemical microsensors

Michael J. Schoening, Juergen Schubert, Willi Zander, Mattea Mueller-Veggian, Andrey V. Legin, Yuri G. Vlasov, Peter Kordos, Hans Lueth

Author Affiliations +

Proceedings Volume 3857, Chemical Microsensors and Applications II; (1999) https://doi.org/10.1117/12.370281
Event: Photonics East '99, 1999, Boston, MA, United States

Abstract

The application of sensitive layers for chemical microsensors consisting of multicomponent compositions and dielectric materials requires specific deposition techniques, since the different chemical and physical properties of the respective components can be significantly disturbed during the deposition process. To avoid this drawback, the pulsed laser deposition technique is suggested as a novel thin film preparation method for such sensor devices.

Citation Download Citation

Michael J. Schoening, Juergen Schubert, Willi Zander, Mattea Mueller-Veggian, Andrey V. Legin, Yuri G. Vlasov, Peter Kordos, and Hans Lueth "Pulsed-laser deposition as a novel preparation technique for chemical microsensors", Proc. SPIE 3857, Chemical Microsensors and Applications II, (18 November 1999); https://doi.org/10.1117/12.370281

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