Numerical study of pulsed-laser scanning deposition in a diluted ambient gas

Jun Li; Runzhang Yuan

doi:10.1117/12.361122

8 September 1999 Numerical study of pulsed-laser scanning deposition in a diluted ambient gas

Jun Li, Runzhang Yuan

Proceedings Volume 3862, 1999 International Conference on Industrial Lasers; (1999) https://doi.org/10.1117/12.361122
Event: International Symposium on Industrial Lasers, 1999, Wuhan, China

Abstract

Laser scanning deposition process is numerically investigated by the means of a Monte-Carlo method. The transport of the atoms ablated from the target through a diluted ambient gas is simulated. Specifically, the influences of the ambient gas (0.0133 - 13.3 Pa), the laser scanning radius, and the substrate-target distance on the spatial distribution and mean energy of the ablated atoms deposited on the substrate are studied. Knowledge useful to understanding the laser scanning deposition process is obtained.

Citation Download Citation

Jun Li and Runzhang Yuan "Numerical study of pulsed-laser scanning deposition in a diluted ambient gas", Proc. SPIE 3862, 1999 International Conference on Industrial Lasers, (8 September 1999); https://doi.org/10.1117/12.361122

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