Development of simplified process for KrF excimer halftone mask with chrome-shielding method

Shinji Kobayashi; N. Oka; Kunio Watanabe; Kiyochige Ohmori; M. Inoue; K. Iguchi

doi:10.1117/12.373323

30 December 1999 Development of simplified process for KrF excimer halftone mask with chrome-shielding method

Shinji Kobayashi, N. Oka, Kunio Watanabe, Kiyochige Ohmori, M. Inoue, K. Iguchi

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373323
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

New simplified process is developed successfully for KrF excimer half-tone mask with chrome shielding method. Process times are reduced to half compared with conventional process in which resist coating and exposure is performed twice. New simplified process is characterized by adopting half-exposure of electron beam, thin chrome film on a half-tone film, and endpoint detection in dry etching process. It is confirmed in this paper that half-tone masks fabricated by simplified process have mask quality and optical capability, which are required in 0.18 micrometer generation devices.

Citation Download Citation

Shinji Kobayashi, N. Oka, Kunio Watanabe, Kiyochige Ohmori, M. Inoue, and K. Iguchi "Development of simplified process for KrF excimer halftone mask with chrome-shielding method", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373323

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