Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography

Frank F. Wu; Wen-Chieh Tang; Kazimierz W. Wirpszo; Xiaoming Guo; Meisheng Xu; Oleg G. Semyonov; C. Huang; Lev Klibanov; Emilio Panarella

doi:10.1117/12.390113

21 July 2000 Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography

Frank F. Wu, Wen-Chieh Tang, Kazimierz W. Wirpszo, Xiaoming Guo, Meisheng Xu, Oleg G. Semyonov, C. Huang, Lev Klibanov, Emilio Panarella

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390113
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The VSX is essentially a miniature discharge capable of emitting soft X-ray radiation. Because the radiation is emitted in small dose in each spark, it is necessary to repeat the phenomenon at high frequency in order to achieve the industrial throughput requirement. Relying on a X-ray collimator (either nested cones or capillary), the point radiation source can deliver a high quality beam suitable for microlithography. Current study shows that the X-ray energy per pulse can be 113 (mu) J or higher with a pulse width (FWHM) of less than 50 ns. A 30 kHz operation in burst mode has been realized. The optimum conditions of the VSX operation have been carefully studied and are reported here. The lifetime can be as high as tens of hours in the low frequency operation or 100 million shots and this figure can be greatly improved. Pinhole camera images show that the source size is less than 1 mm. The throughput of exposing 1 field per hour or more is readily achievable with current parameters and can be greatly improved with the higher operating frequency. The Spherical Pinch is a modified (theta) -pinch with high efficiency in the EUV region of spectrum. Working with different gases, the SPX machine (up to 33 kJ input energy) is optimized for EUV emission and can be fitted in an advanced EUV lithography system. The point source requirements are indeed met by the SPX for such system.

Citation Download Citation

Frank F. Wu, Wen-Chieh Tang, Kazimierz W. Wirpszo, Xiaoming Guo, Meisheng Xu, Oleg G. Semyonov, C. Huang, Lev Klibanov, and Emilio Panarella "Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390113

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

X-rays

Plasma

Spherical lenses

Capacitors

Optical lithography

Electrodes

Beryllium

Show All Keywords

Keywords/Phrases

Search In:

Publication Years