Development of a nanosecond high-energy oscillator/four-pass amplifier excimer laser system

Olivier P. Uteza; Philippe Ch. Delaporte; Bernard L. Fontaine; Marc L. Sentis

doi:10.1117/12.383474

24 April 2000 Development of a nanosecond high-energy oscillator/four-pass amplifier excimer laser system

Olivier P. Uteza, Philippe Ch. Delaporte, Bernard L. Fontaine, Marc L. Sentis

Proceedings Volume 4071, International Conference on Atomic and Molecular Pulsed Lasers III; (2000) https://doi.org/10.1117/12.383474
Event: International Conference on Atomic and Molecular Pulsed Lasers III, 1999, Tomsk, Russian Federation

Abstract

This paper shows experimental and theoretical results obtained with an oscillator-amplifier XeCl laser system of short duration (3 ns) and high energy. This laser system is based on a four pass amplification scheme with off-axis incidence to the active medium to minimize the formation of the Amplified Spontaneous Emission in the amplifier. In this configuration, pulses of approximately 10.2 mJ energy and of 3.8 ns duration have been obtained with a high contrast. These results are discussed and compared to numerical ones issued from a numerical code describing the amplification of the oscillator beam in the active medium.

Citation Download Citation

Olivier P. Uteza, Philippe Ch. Delaporte, Bernard L. Fontaine, and Marc L. Sentis "Development of a nanosecond high-energy oscillator/four-pass amplifier excimer laser system", Proc. SPIE 4071, International Conference on Atomic and Molecular Pulsed Lasers III, (24 April 2000); https://doi.org/10.1117/12.383474

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