Zone plate for x-ray applications

Enzo M. Di Fabrizio; Alessandro Nottola; Stefano Cabrini; Filippo Romanato; Lisa Vaccari; Anna Massimi

doi:10.1117/12.411653

5 January 2001 Zone plate for x-ray applications

Enzo M. Di Fabrizio, Alessandro Nottola, Stefano Cabrini, Filippo Romanato, Lisa Vaccari, Anna Massimi

Proceedings Volume 4145, Advances in X-Ray Optics; (2001) https://doi.org/10.1117/12.411653
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 micrometer are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful design flexibility at several energy regimes.

Citation Download Citation

Enzo M. Di Fabrizio, Alessandro Nottola, Stefano Cabrini, Filippo Romanato, Lisa Vaccari, and Anna Massimi "Zone plate for x-ray applications", Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); https://doi.org/10.1117/12.411653

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