Laser-pulse-induced chemical reactions and surface patterning in Co-Si and Co-Ti-Si films: investigations by x-ray diffraction and atomic force microscopy

Maris Knite; Leonids Shebanov; Valentinas J. Snitka

doi:10.1117/12.413758

30 January 2001 Laser-pulse-induced chemical reactions and surface patterning in Co-Si and Co-Ti-Si films: investigations by x-ray diffraction and atomic force microscopy

Maris Knite, Leonids Shebanov, Valentinas J. Snitka

Author Affiliations +

Proceedings Volume 4157, Laser-Assisted Microtechnology 2000; (2001) https://doi.org/10.1117/12.413758
Event: Laser-Assisted Microtechnology 2000, 2000, St. Petersburg-Pushkin, Russian Federation

Abstract

X-ray diffraction patterns reflected from the laser treated crystalline CoSi₂ layer, the measurements of surface electrical resistance and atomic force microscopy micrographs confirm the 'generation-diffusion-deformational instabilities' model of formation of defect ordered structures of various types. The CO₂ laser induced decrease of the thermal coefficient of resistance to zero in Co-Ti-Si films is realized. X-ray diffraction studies of the treated films confirm that the obtained (alpha) changes with number of laser pulses are caused due to solid phase reaction Co + 2Si equals CoSi₂ and 5Ti + 3Si equals Ti₅Si₃.

Citation Download Citation

Maris Knite, Leonids Shebanov, and Valentinas J. Snitka "Laser-pulse-induced chemical reactions and surface patterning in Co-Si and Co-Ti-Si films: investigations by x-ray diffraction and atomic force microscopy", Proc. SPIE 4157, Laser-Assisted Microtechnology 2000, (30 January 2001); https://doi.org/10.1117/12.413758

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