Preparation of crystalline TiNi shape-memory alloy thin film for MEMS applications

Yongqing Fu; Hejun Du; Weiming Huang; Xu Huang; Jianmin Miao; Yong Liu

doi:10.1117/12.404895

20 October 2000 Preparation of crystalline TiNi shape-memory alloy thin film for MEMS applications

Yongqing Fu, Hejun Du, Weiming Huang, Xu Huang, Jianmin Miao, Yong Liu

Proceedings Volume 4230, Micromachining and Microfabrication; (2000) https://doi.org/10.1117/12.404895
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore

Abstract

Thin film shape-memory alloys have been recognized as a promising and high performance material in the field of microelectromechanical systems applications. In this investigation, TiNi films were prepared by sputtering Ti and Ni target in argon gas using a magnetron sputtering system. Chemical composition, crystallography, microstructure and phase transformation behaviors of the deposited TiNi film were studied. Differential scanning calorimeter results showed that a two-stage transformation occurs in a sequence of monoclinic martensitic phase to rhombohedral phase, then to B2 phase upon heating, and vice versa on cooling. X-ray diffraction analysis also revealed the crystalline structure changes with the change of the temperatures. Nano- indentation reveals the elastic modulus of the film is about 5.11 GPa and the film intrinsic hardness is 2.84 +/- 0.5 GPa. By depositing TiNi films on the bulk micromachined Si cantilever structures, we obtained micro-grippers exhibiting a good shape-memory effect.

Citation Download Citation

Yongqing Fu, Hejun Du, Weiming Huang, Xu Huang, Jianmin Miao, and Yong Liu "Preparation of crystalline TiNi shape-memory alloy thin film for MEMS applications", Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); https://doi.org/10.1117/12.404895

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