Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners

Mark Terry; Ivan Lalovic; Gregory M. Wells; Adlai H. Smith

doi:10.1117/12.435740

14 September 2001 Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners

Mark Terry, Ivan Lalovic, Gregory M. Wells, Adlai H. Smith

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435740
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In this paper we study the effects of changing the operating laser wavelength on the projection lens aberrations of KrF and ArF scanners as measured by the Litel In-Situ Interferometer. Specifically, we quantify the change in 28 individual Zernike coefficients as a function of wavelength as well as the total RMS. Effects on Zernike's exhibiting a field dependent behavior are described in detail. We convert the Z4 terms to Z positions to estimate the displacement of the image plane, and we identify a new chromatic distortion term. Finally, we input the measured wavefronts into a lithographic simulator to estimate the full effects on image placement error.

Citation Download Citation

Mark Terry, Ivan Lalovic, Gregory M. Wells, and Adlai H. Smith "Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435740

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