Carbon antireflective coating (ARC) technology for both KrF and ArF lithography

Yongbeom Kim; Junghyun Lee; Hanku Cho; Joo-Tae Moon

doi:10.1117/12.435632

14 September 2001 Carbon antireflective coating (ARC) technology for both KrF and ArF lithography

Yongbeom Kim, Junghyun Lee, Hanku Cho, Joo-Tae Moon

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435632
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In device integration smaller than 0.18 micrometer design rule, application of the ARC (antireflective coating) technology is unavoidable and SiON ARC and organic ARC are well-known materials up to now. In this paper, as an alternative way, new carbon ARC (CARC) material with the properties of easy stripping and good step coverage is presented. The details of its characteristics related to photo, etch and cleaning process and electrical properties after application to the real devices is investigated. The feasibility of the new CARC for both KrF and ArF lithography was confirmed.

Citation Download Citation

Yongbeom Kim, Junghyun Lee, Hanku Cho, and Joo-Tae Moon "Carbon antireflective coating (ARC) technology for both KrF and ArF lithography", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435632

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