Effect of hole shape error on lithography process window

Rakesh Kumar; Moitreyee Mukherjee-Roy; Cher-Huan Tan

doi:10.1117/12.435672

14 September 2001 Effect of hole shape error on lithography process window

Rakesh Kumar, Moitreyee Mukherjee-Roy, Cher-Huan Tan

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435672
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Intra-field lens aberrations and distortions affect the shape of contact hole patterning. This effect is more severe with defocus. In this paper, we have studied the effect of difference in horizontal and vertical diameter of a contact hole on the lithography process window for different illumination conditions using a 0.68NA step and scan system. It is found that the depth of focus (DOF) for 0.22um contact hole patterning shrinks considerably taking into account the horizontal and vertical diameter measurements as compared to the average diameter measurements alone.

Citation Download Citation

Rakesh Kumar, Moitreyee Mukherjee-Roy, and Cher-Huan Tan "Effect of hole shape error on lithography process window", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435672

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