Optimal positions for SB assignment and the specification of SB width variation

Chih-Ming Lai; Ru-Gun Liu; Tsai-Sheng Gau; Fu-Jye Liang; Shuo-Yen Chou; Lin-Hung Shiu

doi:10.1117/12.435683

14 September 2001 Optimal positions for SB assignment and the specification of SB width variation

Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Fu-Jye Liang, Shuo-Yen Chou, Lin-Hung Shiu

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435683
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

High NA illumination system and off-axis illumination (OAI) have been shown as two of the most practical resolution enhancement techniques (RET) available for micro-lithography. However, these two illumination approaches may reduce the DOF of iso-patterns. To overcome this problem, scattering bar (SB) assignment has been wildly used. In this paper, the discussions are focused on SB variables of iso-features. The most important variable of SB usage is where is the suitable assignment position. A simply efficient rule has been found to easily catch the optimal position of SB assignment. For OAI illumination, the optimal SB position is exactly the same with the defocus side-lobe position of iso-line. The effect of the secondary pair of SB is also discussed in this paper, and it is found that if the secondary SB pair was not at the optimal position, the process window would be reduced. Another major topic in this paper is the specification of SB width. Here we design a test pattern to target the specification of SB width. The experimental results might give us a clear specification of SB width.

Citation Download Citation

Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Fu-Jye Liang, Shuo-Yen Chou, and Lin-Hung Shiu "Optimal positions for SB assignment and the specification of SB width variation", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435683

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