Ultra-line-narrowed F2 laser for microlithography

Hiroshi Komori; Tatsuya Ariga; Hidenori Watanabe; Takahito Kumazaki; Naoki Kitatochi; Kotaro Sasano; Yoshifumi Ueno; Toshihiro Nishisaka; Ryoichi Nohdomi; Kazuaki Hotta; Hakaru Mizoguchi; Kiyoharu Nakao

doi:10.1117/12.456815

25 February 2002 Ultra-line-narrowed F₂ laser for microlithography

Hiroshi Komori, Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Author Affiliations +

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456815
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

The Association of Super-Advanced Electronics Technologies (ASET) started The F₂ Laser Lithography Development Project in March 2000, to clarify solutions of base F₂ lithography technologies. In this project, we are developing an ultra line-narrowed F₂ laser light source for exposure tools tat are employing dioptric projection optics. We have developed an intermediate engineering injection- locking laser system that has an oscillator laser and an amplifier to study the feasibility of an ultra line-narrowed F₂ laser. A spectral bandwidth of <0.2pm (FWHM) at a repetition rate of 1000Hz and an average power of 14W has been achieved with this laser system. The laser output performance dependence on the relative delay between oscillator laser and amplifier is also measured.

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Hiroshi Komori, Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, and Kiyoharu Nakao "Ultra-line-narrowed F₂ laser for microlithography", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456815

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