Computer simulation of photosensitive process of image materials

Xiaowei Li; Yuchen Sun; Xiaoyong Hu; Lianshui Zhang

doi:10.1117/12.441582

25 September 2001 Computer simulation of photosensitive process of image materials

Xiaowei Li, Yuchen Sun, Xiaoyong Hu, Lianshui Zhang

Proceedings Volume 4553, Visualization and Optimization Techniques; (2001) https://doi.org/10.1117/12.441582
Event: Multispectral Image Processing and Pattern Recognition, 2001, Wuhan, China

Abstract

Silver halide emulsion is an important component of image materials. They are widely used in many kinds of fields and have a very prosperous prospect. This kind of method provides a new way to research the photosensitive process of image materials. Compared with the traditional methods, it is more economical and has a shorter experimental period. In this paper, Nucleation and Growth model and Monte Carlo method were adopted to simulate the formation of image and results in different kinds of outside conditions and material properties will be given.

Citation Download Citation

Xiaowei Li, Yuchen Sun, Xiaoyong Hu, and Lianshui Zhang "Computer simulation of photosensitive process of image materials", Proc. SPIE 4553, Visualization and Optimization Techniques, (25 September 2001); https://doi.org/10.1117/12.441582

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