Paper
21 November 2001 MEMS applications of porous silicon
Wolfgang Benecke, Alexandra Splinter
Author Affiliations +
Proceedings Volume 4592, Device and Process Technologies for MEMS and Microelectronics II; (2001) https://doi.org/10.1117/12.449009
Event: International Symposium on Microelectronics and MEMS, 2001, Adelaide, Australia
Abstract
Porous silicon fabricated by partial electrochemical dissolution of bulk silicon, shows outstanding material properties. The nanostructure of the remaining Si-skeleton is used for specific optical devices, such as emitters and filters. The high internal surface of the material opens new opportunities for different types of microsensors and -actuators and microsystem concepts. The porous layers can be used as sacrificial layers due to the high reactivity of the material which leads to a new class of micromachined MEMS devices. A brief overview on the historic evolution of the material is given. The base technologies for the fabrication of porous silicon layers are described. An overview on specific applications is given to demonstrate the potential of the material and the technology behind.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Benecke and Alexandra Splinter "MEMS applications of porous silicon", Proc. SPIE 4592, Device and Process Technologies for MEMS and Microelectronics II, (21 November 2001); https://doi.org/10.1117/12.449009
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Cited by 7 scholarly publications.
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KEYWORDS
Silicon

Etching

Semiconducting wafers

Microelectromechanical systems

Sensors

Silicon carbide

Gas sensors

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