Novel fluoro copolymers for 157-nm photoresists: a progress report

Christoph Hohle; Stefan Hien; Christian Eschbaumer; Joerg Rottstegge; Michael Sebald

doi:10.1117/12.474252

24 July 2002 Novel fluoro copolymers for 157-nm photoresists: a progress report

Christoph Hohle, Stefan Hien, Christian Eschbaumer, Joerg Rottstegge, Michael Sebald

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474252
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Several fluoro-substituted polymers consisting of acid cleavable methacryoic or cinnamic acid tert.-butyl ester compounds copolymerized with maleic acid anhydride derivatives were synthesized by radical copolymerization. Vacuum ultraviolet transmission measurements of the samples reveal absorbances down to 5micrometers ^-1 despite of the strongly absorbing anhydride moiety which serves as silylation anchor for the application of the Chemical Amplification of Resist Lines (CARL) process, one of the promising approaches for sub-90nm pattern fabrication. Some of the samples exhibit resolutions down to 110nm dense at 157nm exposure using an alternating phase shift mask. The feasibility of the CARL principle including the silylation reaction after development has been demonstrated with selected fluorinated polymer samples.

Citation Download Citation

Christoph Hohle, Stefan Hien, Christian Eschbaumer, Joerg Rottstegge, and Michael Sebald "Novel fluoro copolymers for 157-nm photoresists: a progress report", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474252

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