Novel molecular resists based on inclusion complex of cyclodextrin

Jin-Baek Kim; Young-Gil Kwon; Hyo-Jin Yun; Jae-Hak Choi

doi:10.1117/12.474286

24 July 2002 Novel molecular resists based on inclusion complex of cyclodextrin

Jin-Baek Kim, Young-Gil Kwon, Hyo-Jin Yun, Jae-Hak Choi

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474286
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

A positive working molecular photoresist based on (beta) -cyclodextrin ((beta) -CD) and its inclusion complex ((beta) -CD-IC) has been developed. Cyclodextrin is one of the most important host molecules in supramolecular systems. 1-Adamantanecarboxylic acid (Ad-COOH) is employed as a guest molecule to increase the dry etch resistance. (beta) -CD and (beta) -CD-IC were protected with t-BOC to control the dissolution rate with various feed ratios of di-t-butyl dicarbonate. The t-BOC protecting ratio turns out about 34 mol% which corresponds to the protection of primary hydroxyl groups on the upper rim of (beta) -CD. The t-BOC-protected (beta) -CD has low absorbances at 248 and 193 nm, and good film forming property. Using t-BOC-protected (beta) -CD and (beta) -CD-IC, submicron patterns were delineated when it was exposed to a KrF stepper and developed with a 2.38 wt% aqueous TMAH solution.

Citation Download Citation

Jin-Baek Kim, Young-Gil Kwon, Hyo-Jin Yun, and Jae-Hak Choi "Novel molecular resists based on inclusion complex of cyclodextrin", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474286

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