Solutions for printing sub-100-nm contacts with ArF

Paul Graeupner; Aksel Goehnermeier; Martin Lowisch; Reiner B. Garreis; Donis G. Flagello; Steven G. Hansen; Robert John Socha; Carsten Koehler

doi:10.1117/12.474569

30 July 2002 Solutions for printing sub-100-nm contacts with ArF

Paul Graeupner, Aksel Goehnermeier, Martin Lowisch, Reiner B. Garreis, Donis G. Flagello, Steven G. Hansen, Robert John Socha, Carsten Koehler

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474569
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

This study assesses the various approaches to printing contacts in the sub 100nm regime using 193nm. Traditional techniques are analyzed along with the use of tri-tone contacts and pupil filtering. Approaches using attPSM masks looks promising down to pitches of 300nm. Below this, assist features may be needed to prevent residual artifacts due to sidelobes. For pitches > 400nm the use of tri-tone masks show a significant improvement in process latitude and ease of overlapping process windows. The pupil filter solution does not seem provide any significant improvement as compared to other solutions with the exception that it provides the lower MEF. Realization of this solution will increase machine complexity and will possibly impact throughput, especially if using transmission filters. However, pupil filtering can be an option for isolated contact layers that are printed with binary masks. We find that the process and enhancement techniques to print a dense contacts and isolated contacts to be vastly different. This may require a split into two exposures if an extensive pitch range is needed.

Citation Download Citation

Paul Graeupner, Aksel Goehnermeier, Martin Lowisch, Reiner B. Garreis, Donis G. Flagello, Steven G. Hansen, Robert John Socha, and Carsten Koehler "Solutions for printing sub-100-nm contacts with ArF", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474569

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