Flexible mask specifications

Shigeki Nojima; Shoji Mimotogi; Masamitsu Itoh; Osamu Ikenaga; Shigeru Hasebe; Kohji Hashimoto; Soichi Inoue; Mineo Goto; Ichiro Mori

doi:10.1117/12.477004

1 August 2002 Flexible mask specifications

Shigeki Nojima, Shoji Mimotogi, Masamitsu Itoh, Osamu Ikenaga, Shigeru Hasebe, Kohji Hashimoto, Soichi Inoue, Mineo Goto, Ichiro Mori

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.477004
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

A methodology for specifying mask quality named flexible mask specifications is proposed. The methodology consists of two major concepts. One is flexibly selected patterns to guarantee mask quality for each device and each level of devices using full-chip level lithography simulation. The other is flexibly changeable combination of each tolerance for each error component. The validity of flexible mask specifications is proved on masks of a 130nm node memory device. Using the flexible mask specifications, we have confirmed that mask manufacturing yield rise up by 20 percent on masks of a 175nm node memory device compared with the yield of the masks judged by conventional mask specifications.

Citation Download Citation

Shigeki Nojima, Shoji Mimotogi, Masamitsu Itoh, Osamu Ikenaga, Shigeru Hasebe, Kohji Hashimoto, Soichi Inoue, Mineo Goto, and Ichiro Mori "Flexible mask specifications", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.477004

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