Fabrication of suspended membranes for thermal sensors using high-density plasma etching

Angeliki Tserepi; C. Tsamis; Evangelos Gogolides; A. G. Nassiopoulou

doi:10.1117/12.462883

19 April 2002 Fabrication of suspended membranes for thermal sensors using high-density plasma etching

Angeliki Tserepi, C. Tsamis, Evangelos Gogolides, A. G. Nassiopoulou

Proceedings Volume 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002; (2002) https://doi.org/10.1117/12.462883
Event: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, 2002, Cannes-Mandelieu, France

Abstract

In this work, we describe a front-side Si micromachining process for the fabrication of suspended membranes for thermal sensors. Membrane release is achieved by means of lateral isotropic etching of the bulk silicon substrate, the etching being optimized for high rates and high selectivity with respect to the membrane material and the photoresist that is used to protect the device. Lateral Si etch rates of the order of 6-7 micrometers /min have been achieved in a high- density F-based plasma, which permits a reasonable etching time for the release of the membrane and the simultaneous formation of the cavity underneath that ensure thermal isolation of the final device.

Citation Download Citation

Angeliki Tserepi, C. Tsamis, Evangelos Gogolides, and A. G. Nassiopoulou "Fabrication of suspended membranes for thermal sensors using high-density plasma etching", Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); https://doi.org/10.1117/12.462883

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