Photo- and thermo-induced refractive index change of GeO2-B2O3-SiO3 thin films fabricated by PECVD: fabrication of extremely thermally stabilized gratings

Hiroaki Nishiyama; Isamu Miyamoto; Kenji Kintaka; Junji Nishii

doi:10.1117/12.499713

19 February 2003 Photo- and thermo-induced refractive index change of GeO₂-B₂O₃-SiO₂ thin films fabricated by PECVD

Hiroaki Nishiyama, Isamu Miyamoto, Kenji Kintaka, Junji Nishii

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.499713
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

We found out that GeO₂-B₂O₃-SiO₂ thin films fabricated by plasma enhanced chemical vapor deposition method exhibited not only large photo-induced but also thermo-induced refractive index increases, both of which were above 10^-3. The former was observed after irradiation with KrF excimer laser, and the latter was induced by annealing at 600°C. The thermo-induced refractive index increase was closely related to the formation of thermo-induced absorption bands during the annealing, and could be suppressed by the laser irradiation prior to the annealing. Bragg gratings were printed in the films by the laser irradiation through the phase mask without H₂ loading. The diffraction efficiency decreased rapidly by the annealing up to 500°C, but drastically increased after the annealing at 600°C. The thermo-induced gratings couldn’t be erased by the repeated heat treatments between room temperature and 600°C at all. Considering the suppression of thermo-induced index increase by the laser irradiation, this grating was expected to have the reverse pattern of refractive index compared to that of the as-printed one, and might be applicable to the highly reliable optical and sensing devices.

Citation Download Citation

Hiroaki Nishiyama, Isamu Miyamoto, Kenji Kintaka, and Junji Nishii "Photo- and thermo-induced refractive index change of GeO₂-B₂O₃-SiO₂ thin films fabricated by PECVD", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.499713

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