Paper
16 June 2003 Distortion management strategy for EPL reticle
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Abstract
For position measurements of the EPL reticle, a new concept reticle holder is proposed. This holder clamps the same surface during measurement as during exposure in Nikon's EPL tool, the EB Stepper. Thus the holder reproduces the deformation caused by clamping in a metrology tool with that in the EB Stepper. Investigation by simulation is described. Furthermore, an experimental holder based on this concept was manufactured, and the deformation of a 200 mm EPL reticle was measured. The experimental results and simulation results show an advantage of this method.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hajime Yamamoto, Takashi Aoyama, Noriyuki Hirayanagi, and Kazuaki Suzuki "Distortion management strategy for EPL reticle", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.483743
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CITATIONS
Cited by 3 scholarly publications and 1 patent.
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KEYWORDS
Reticles

Distortion

Metrology

Semiconducting wafers

Sensors

Data corrections

Electron beam lithography

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