Fast and rigorous three-dimensional mask diffraction simulation using Battle-Lemarie wavelet-based multiresolution time-domain method

Michael S. Yeung

doi:10.1117/12.485433

26 June 2003 Fast and rigorous three-dimensional mask diffraction simulation using Battle-Lemarie wavelet-based multiresolution time-domain method

Michael S. Yeung

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485433
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The recently developed multiresolution time-domain (MRTD) method is applied to the rigorous simulation of diffraction from three-dimensional phase-shifting mask structures. The results of a convergence study of MRTD are presented, together with performance benchmarks, for comparison with the finite-difference time-domain (FDTD) method. The results show that MRTD is one order of magnitude faster than FDTD for the same level of accuracy.

Citation Download Citation

Michael S. Yeung "Fast and rigorous three-dimensional mask diffraction simulation using Battle-Lemarie wavelet-based multiresolution time-domain method", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485433

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