Nikon F2 exposure tool development

Soichi Owa; Yukako Matsumoto; Yasuhiro Ohmura; Shigeru Sakuma; Takashi Aoki; Jin Nishikawa; Hiroyuki Nagasaka; Takeyuki Mizutani; Naomasa Shiraishi; Kazuhiro Kido; Issei Tanaka; Jun Nagatsuka

doi:10.1117/12.485451

26 June 2003 Nikon F2 exposure tool development

Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, Jun Nagatsuka

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485451
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Present status of development of F2 (157nm) exposure tool in Nikon is described. Key points of F2 exposure tool are reported; low aberration projection optics, CaF2 quality, coating durability and gas purging of the pellicle space. We also report the measurement of refractive index inhomogeneity inside CaF2 crystals, which is suspected as the cause of local flare. Characteristics of high NA optics over 0.9 are investigated by imaging simulations for both 193nm and 157nm wavelengths, which are compared NA=0.85 imaging.

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Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, and Jun Nagatsuka "Nikon F2 exposure tool development", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485451

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