Wet developable bottom anti-reflective coatings

Tadashi Hatanaka; Shigeo Kimura; Tomoyuki Enomoto; Yasuyuki Nakajima

doi:10.1117/12.534654

14 May 2004 Wet developable bottom antireflective coatings

Tadashi Hatanaka, Shigeo Kimura, Tomoyuki Enomoto, Yasuyuki Nakajima

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.534654
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Dyed photo resist and/or Top Anti-Reflective Coatings (TARC) has been used as mold in ion doping layer. However, in sub 0.25-micron pattern, this system is difficult to apply due to their poor CD control ability. As the chip size is shrunk to sub 0.25-micron in ion doping layer, the use of Organic Bottom Anti-Reflective Coatings (BARC) is strongly required. On the other hand, current Organic KrF BARCs does not dissolve in alkaline developer, and the dry etching process is indispensable in order to remove Organic BARCs. For this reason, it is difficult to apply the current Dry type Organic BARCs to the ion doping layer. To solve this problem, Wet Developable Organic BARCs to be applied to sub 0.25-micron, which have alkaline solubility have been required. NCA800 series that are the suitable alkaline developable KrF Organic BARCs, has been developed and achieved. Alkaline solubility of these BARCs was controllable by baking temperature. NCA800 series show the excellent litho performance and coating property.

Citation Download Citation

Tadashi Hatanaka, Shigeo Kimura, Tomoyuki Enomoto, and Yasuyuki Nakajima "Wet developable bottom antireflective coatings", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.534654

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