Paper
28 May 2004 Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft x-ray region
M. S. Bibishkin, D. P. Chekhonadskih, N. I. Chkhalo, E. B. Kluyenkov, A. E. Pestov, Nikolai N. Salashchenko, L. A. Shmaenok, I. G. Zabrodin, S. Yu. Zuev
Author Affiliations +
Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.556949
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation
Abstract
In the paper, we report development of two reflectometers in IPM RAS. One enables investigation of the angular and spectral characteristics of mirrors with any shape of a reflecting surface in the 0.6-20 nm spectral range. The other, designed especially to study the influence of EUV sources on the reflecting characteristics of the mirrors, allows testing of flat samples. Owing to a high aperture ratio (solid angle of 0.034 steradian), high reflection coefficient of mirrors, powerful windowless X-ray tube, and effective detector, the reflectometer provides a resolution of the reflection coefficient variation at a level of 0.1%.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. S. Bibishkin, D. P. Chekhonadskih, N. I. Chkhalo, E. B. Kluyenkov, A. E. Pestov, Nikolai N. Salashchenko, L. A. Shmaenok, I. G. Zabrodin, and S. Yu. Zuev "Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft x-ray region", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.556949
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Cited by 35 scholarly publications.
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KEYWORDS
Mirrors

Reflectometry

X-rays

Extreme ultraviolet

Sensors

Extreme ultraviolet lithography

Reflection

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