Extension of photolithography

Masaomi Kameyama; Martin McCallum

doi:10.1117/12.557793

20 August 2004 Extension of photolithography

Masaomi Kameyama, Martin McCallum

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557793
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics. We will show how the development of new materials has, in almost all cases, been the enabling factor to implementation of new, lower wavelength photolithgraphies. We will discuss the factors driving the economics of lithography and how this has previously, and continues to have, a pivotal influence on which lithography technique is implemented into production. The likely limits of photolithography below 50nm resolution will be shown together with the factors likely to finally force us out of photolithography.

Citation Download Citation

Masaomi Kameyama and Martin McCallum "Extension of photolithography", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557793

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