High-temperature multilayers

Sergiy Yulin; Nicolas Benoit; Torsten Feigl; Norbert Kaiser

doi:10.1117/12.617535

6 May 2005 High-temperature multilayers

Sergiy Yulin, Nicolas Benoit, Torsten Feigl, Norbert Kaiser

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.617535
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The effect of elevated temperatures on the optical and structural stability of MoSi₂/Si and Mo/C/Si/C multilayer coatings was investigated. The multilayer mirrors were designed for normal-incidence reflectivity at a wavelength of about 13.5 nm. The multilayers were deposited by dc-magnetron sputtering and subsequently annealed at temperatures of 400 °C and 500 °C for 1, 10 and 100 hours. X-ray scattering, transmission electron microscopy, atomic force microscopy and normal-incidence reflectivity measurements were used for the characterization of the multilayer structures. We achieved maximal normal-incidence reflectivities of 41.2 % and 59.6 % for as-deposited MoSi₂/S and Mo/C/Si/C multilayer mirrors. While the optical properties of Mo/C/Si/C multilayers changed monotonically during annealing time at temperatures of more than 400 °C, the MoSi₂/Si multilayers showed a superior thermal stability up to 500 °C. New barrier layer materials were also suggested to enhance the thermal stability of Mo/Si multilayers. Interface-engineered Mo/Si multilayer mirrors were designed to combine both a high reflectivity of more than 60 % at 13.5 nm and a superior long-term thermal stability of up to 500 °C.

Citation Download Citation

Sergiy Yulin, Nicolas Benoit, Torsten Feigl, and Norbert Kaiser "High-temperature multilayers", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.617535

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