Liquid metal micro-droplet generator for laser produced plasma target delivery used in an extreme ultra-violet source

J. Martin Algots; Oscar Hemberg; Alexander Bykanov

doi:10.1117/12.601045

6 May 2005 Liquid metal micro-droplet generator for laser produced plasma target delivery used in an extreme ultra-violet source

J. Martin Algots, Oscar Hemberg, Alexander Bykanov

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601045
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The implementation of a Laser Produced Plasma Extreme Ultra-Violet (LPP EUV) source requires a high-power laser focused onto a target. In order to minimize the required laser input power the target material must have a high conversion efficiency to 13.5 nanometer radiation. Ideally, a pulsed laser is used and the target should be delivered in small uniform volumes to a point in space at high repetition rates. The small volumes minimize the amount of debris, the high repetition rates enable higher power systems and the free space delivery alleviates thermal issues and allows large collection angles. It has been demonstrated that lithium and tin have very high conversion efficiencies and system solutions exist to use these materials. In this paper we describe the requirements and performance of a liquid metal micro-droplet target generator capable of dispensing both lithium and tin. Finally it is shown that the current generator performance is sufficient to support stable source operation.

Citation Download Citation

J. Martin Algots, Oscar Hemberg, and Alexander Bykanov "Liquid metal micro-droplet generator for laser produced plasma target delivery used in an extreme ultra-violet source", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601045

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