Paper
12 May 2005 What makes a coherence curve change?
Author Affiliations +
Abstract
With use of OPC on the rise, lithographers have now added coherence behavior to their list of important concerns about an imaging tool. Previously, parameters like nested-to-isolated bias were important. Now, we need to think about the behavior of an entire coherence curve, which is a plot of printed linewidth versus pitch for a set of features at constant reticle linewidth. While the precise shape of a curve may not be especially important, the lithographer will want to know the tool-to-tool variation and whether the curve will change with time. That variation is affected by at least both lens aberrations and illuminator pupil fill, and potentially by other factors as well, like flare or optics contamination. We have made a systematic study of coherence sensitivity to a host of potential factors, and we will present a sensitivity analysis, identifying the big and the small drivers of coherence-curve behavior.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen P. Renwick "What makes a coherence curve change?", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.598939
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CITATIONS
Cited by 4 scholarly publications and 5 patents.
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KEYWORDS
Fiber optic illuminators

Diffraction

Monochromatic aberrations

Coherence (optics)

Lithography

Reticles

Binary data

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