Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

Jian Zhang; Al Palaniappan; Xiaodi Su; Francis E. H. Tay

doi:10.1117/12.607331

8 December 2004 Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

Jian Zhang, Al Palaniappan, Xiaodi Su, Francis E. H. Tay

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607331
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FTIR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.

Citation Download Citation

Jian Zhang, Al Palaniappan, Xiaodi Su, and Francis E. H. Tay "Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607331

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