Paper
25 August 2005 The network structure of the merit function space of EUV mirror systems
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Abstract
The merit function space of mirror systems for EUV lithography is studied. Local minima situated in a multidimensional merit function space are connected via links that contain saddle points and form a network. In this work we present the first networks for EUV lithographic objectives and discuss how these networks change when control parameters, such as aperture and field are varied and constraints are used to limit the variation domain of the variables. A good solution in a network obtained with a limited number of variables has been locally optimized with all variables to meet practical requirements.
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Oana Marinescu and Florian Bociort "The network structure of the merit function space of EUV mirror systems", Proc. SPIE 5874, Current Developments in Lens Design and Optical Engineering VI, 587402 (25 August 2005); https://doi.org/10.1117/12.614862
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Cited by 1 scholarly publication and 1 patent.
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KEYWORDS
Space mirrors

Mirrors

Extreme ultraviolet

Aspheric lenses

Control systems

Distortion

Extreme ultraviolet lithography

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