Fundamental parameter extraction for a dry/immersion hybrid photoresist for contact hole applications

Stewart A. Robertson; Shintaro Yamada; Joanne M. Leonard

doi:10.1117/12.658030

29 March 2006 Fundamental parameter extraction for a dry/immersion hybrid photoresist for contact hole applications

Stewart A. Robertson, Shintaro Yamada, Joanne M. Leonard

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 615312 (2006) https://doi.org/10.1117/12.658030
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

EPIC^TM 2330 photoresist is an imaging material designed for conventional dry and immersion ArF exposure, its formulation is optimized for contact hole features. Although it performs well in both imaging modes, with good profile, it is not known whether the presence of water impacts the materials fundamental imaging characteristics. Acid generation efficiency, characteristic acid diffusion length and dissolution rates are determined for EPIC 2330 under dry and immersion imaging conditions. The results show, that within measurement errors, no difference is observed for these fundamental parameters whether water is present during exposure, or not.

Citation Download Citation

Stewart A. Robertson, Shintaro Yamada, and Joanne M. Leonard "Fundamental parameter extraction for a dry/immersion hybrid photoresist for contact hole applications", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615312 (29 March 2006); https://doi.org/10.1117/12.658030

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