Development of EUV resists in homogenous CO2 solutions using CO2 compatible salts (CCS): a kinetic view of dissolution of conventional resists in supercritical CO2

James DeYoung; Mark Wagner; Chris Harbinson; Merrick Miles; Amy Zweber; Ruben Carbonell

doi:10.1117/12.655881

11 April 2006 Development of EUV resists in homogenous CO₂ solutions using CO₂ compatible salts (CCS): a kinetic view of dissolution of conventional resists in supercritical CO₂

James DeYoung, Mark Wagner, Chris Harbinson, Merrick Miles, Amy Zweber, Ruben Carbonell

Author Affiliations +

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 615345 (2006) https://doi.org/10.1117/12.655881
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A novel method for the development of standard EUV photoresists in CO₂ using CO₂ compatible salts (CCS) is described and examined using a quartz crystal microbalance (QCM) technique in CO₂. The fundamental steps of this development process are proposed to be 1) photoresist modification via CCS interaction with Bronsted acid groups in the resist; and 2) dissolution of the modified resist into CO₂. Removal rates of non-exposed photoresist from the quartz crystal can be studied in real time under a variety of conditions to help elucidate the kinetics and mechanism of the CCS development process. A series of runs from 35 to 50 C at the same CO₂ density showed a strong effect of temperature on the development rate. In the presence of a large excess of CCS, the kinetics of dissolution appear to be zero order. An Arrhenius plot generated by this data gave an activation energy of 79.0 kJ/mol. The zero order kinetics of dissolution was confirmed with a series of runs at various CCS concentration that showed insignificant rate effects. Dynamic flow of the CCS solution in the QCM cell gave ~50% increase in rate of resist removal relative to the standard conditions using static CCS solution. The indication from the three sets of QCM experiments described here is that dissolution of the CCS modified polymer is the slow step in CCS development.

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James DeYoung, Mark Wagner, Chris Harbinson, Merrick Miles, Amy Zweber, and Ruben Carbonell "Development of EUV resists in homogenous CO₂ solutions using CO₂ compatible salts (CCS): a kinetic view of dissolution of conventional resists in supercritical CO₂", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615345 (11 April 2006); https://doi.org/10.1117/12.655881

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