Liquid crystal orientation on patterns etched in Silicon on Insulator

H. Desmet; K. Neyts; R. Baets

doi:10.1117/12.668350

20 April 2006 Liquid crystal orientation on patterns etched in Silicon on Insulator

H. Desmet, K. Neyts, R. Baets

Proceedings Volume 6183, Integrated Optics, Silicon Photonics, and Photonic Integrated Circuits; 61831Z (2006) https://doi.org/10.1117/12.668350
Event: SPIE Photonics Europe, 2006, Strasbourg, France

Abstract

Liquid Crystals have many applications in photonics, but often the geometrical properties of the photonic structures give problems for controlling the alignment of the liquid crystal. We demonstrate the effect on the orientation of a nematic liquid crystal by structures etched in Silicon-on-Insulator (SOI) wafers, produced by photolithography. We characterize the alignment effect of several patterns, including configurations that allow multiple stable director orientations. Also, the influence of a surface treatment (like deposition of a monolayer on the structured surface) is discussed.

Citation Download Citation

H. Desmet, K. Neyts, and R. Baets "Liquid crystal orientation on patterns etched in Silicon on Insulator", Proc. SPIE 6183, Integrated Optics, Silicon Photonics, and Photonic Integrated Circuits, 61831Z (20 April 2006); https://doi.org/10.1117/12.668350

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