Paper
15 June 2006 High-voltage-compatable fully depleted CCDs
S. E. Holland, C. J. Bebek, K. S. Dawson, J. H. Emes, M. H. Fabricius, J. A. Fairfield, D. E. Groom, A. Karcher, W. F. Kolbe, N. P. Palaio, N. A. Roe, G. Wang
Author Affiliations +
Abstract
We describe charge-coupled device (CCD) development activities at the Lawrence Berkeley National Laboratory (LBNL). Back-illuminated CCDs fabricated on 200-300 μm thick, fully depleted, high-resistivity silicon substrates are produced in partnership with a commercial CCD foundry. The CCDs are fully depleted by the application of a substrate bias voltage. Spatial resolution considerations require operation of thick, fully depleted CCDs at high substrate bias voltages. We have developed CCDs that are compatible with substrate bias voltages of at least 200V. This improves spatial resolution for a given thickness, and allows for full depletion of thicker CCDs than previously considered. We have demonstrated full depletion of 650-675 μm thick CCDs, with potential applications in direct x-ray detection. In this work we discuss the issues related to high-voltage operation of fully depleted CCDs, as well as experimental results on high-voltage-compatible CCDs.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. E. Holland, C. J. Bebek, K. S. Dawson, J. H. Emes, M. H. Fabricius, J. A. Fairfield, D. E. Groom, A. Karcher, W. F. Kolbe, N. P. Palaio, N. A. Roe, and G. Wang "High-voltage-compatable fully depleted CCDs", Proc. SPIE 6276, High Energy, Optical, and Infrared Detectors for Astronomy II, 62760B (15 June 2006); https://doi.org/10.1117/12.672393
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Cited by 20 scholarly publications.
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KEYWORDS
Charge-coupled devices

Silicon

Point spread functions

Oxides

Transistors

X-rays

Diodes

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