Paper
21 March 2008 Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas
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Abstract
We investigated the protection of a Ru-capped Mo/Si multilayer from surface oxidation under exposure to EUV radiation in the presence of water vapor and isopropyl alcohol (IPA). Degradation of the reflectance of the Ru-capped Mo/Si multilayer by EUV irradiation was controlled by introducing IPA gas. We also investigated the reduction effect of the oxide layer in a multilayer mirror by introducing ethanol and exposed EUV. The Ru-capped multilayer sample was exposed to EUV radiation in the presence of only water vapor to oxidize its surface. The reflectance decreased by about 1.5%. Then the sample was exposed to EUV radiation in the presence of only ethanol vapor. The reflectivity of the sample was recovered to +0.5%, and the atomic concentration of oxygen in the irradiated area was decreased by EUV irradiation in the presence of ethanol.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keigo Koida, Masahito Niibe, Yukinobu Kakutani, Shuichi Matsunari, Takashi Aoki, Shigeru Terashima, Takahiro Nakayama, Hiromitsu Takase, and Yasuaki Fukuda "Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69213C (21 March 2008); https://doi.org/10.1117/12.771814
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Cited by 2 scholarly publications.
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KEYWORDS
Mirrors

Reflectivity

Extreme ultraviolet

Extreme ultraviolet lithography

Bioalcohols

Carbon

Oxides

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