Pulsed-laser deposition of thin Fe film on Cu(100): a kinetic Monte Carlo simulation

Juanmei Hu; Fengmin Wu; Yuzhang Fang

doi:10.1117/12.792181

11 March 2008 Pulsed-laser deposition of thin Fe film on Cu(100): a kinetic Monte Carlo simulation

Juanmei Hu, Fengmin Wu, Yuzhang Fang

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 698407 (2008) https://doi.org/10.1117/12.792181
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

The initial stages of multilayer Fe thin film on Cu(100) surface prepared by pulsed-laser deposition(PLD) were simulated by means of kinetic Monte Carlo(kMC) method. We focus on examining the effect of high instantaneous deposition rate and energetic adatoms on nucleation and the surface roughness of Fe film on Cu(100) surface. The simulation results show that high instantaneous deposition rate alone is insufficient to explain the layer-by-layer growth in PLD, and it is the combination of the kinetic energy and high instantaneous deposition rate that leads to improved quality of the film surface.

Citation Download Citation

Juanmei Hu, Fengmin Wu, and Yuzhang Fang "Pulsed-laser deposition of thin Fe film on Cu(100): a kinetic Monte Carlo simulation", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698407 (11 March 2008); https://doi.org/10.1117/12.792181

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